Parallel optical nanolithography using nanoscale bowtie aperture array.
نویسندگان
چکیده
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.
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ورودعنوان ژورنال:
- Optics express
دوره 18 7 شماره
صفحات -
تاریخ انتشار 2010